TRAVIT: References

S. Babin, G. Glushenko, T. Weber, T. Kaesebier, E.-B. Kley, and A. Szeghalmi,
Application of double patterning technology to fabricate optical elements: Process simulation, fabrication, and measurement,
J. Vac. Sci. Tech. B 30, 031605 (2012)

S. Babin, K. Bay,
Modeling of CD and placement error in multi-spacer patterning technology,
Proc. SPIE v. 7640, (2010) 764021

S. Babin; K. Bay;
Evolution of etch profile and CD variation in maskmaking and SPT: simulations using TRAVIT software,
Proc. SPIE v.7748 (2010) 774813

S. Babin, K. Bay, S. Okulovsky,
Simulation of Dry Etch Profile Dynamics and CD Variation due to Microloading,
Proc. SPIE, v. 6283 (2006) 62831R

S. Babin, K. Bay, S. Okulovsky,
TRAVIT: software tool to simulate dry etch in maskmaking,
Proc. SPIE, v.5853 (2005) 66

S. Babin, K. Bay, S. Okulovsky,
Prediction of etch profile and CD variation due to dry etch using TRAVIT software tool,
Proc. SPIE, v.5853 (2005) 66

S. Babin, K. Bay, S. Okulovsky,
Software to Simulate Dry Etch in Photomask Fabrication
Proc. SPIE, v. 5567 (2004) 183